Copper Damascene processes are critical for the fabrication of interconnects in semiconductor applications. The semiconductor industry is challenged by cost, competitive scaling, and yield improvements. Precise and reliable on-line metrology of Cu processes is required for successful and efficient production as the feature sizes of interconnects continue to shrink.
For over 2 decades, QUALI-LINE® Chemical monitoring systems have been the industry standard for Analysis and Control of Copper Damascene Processes. The QUALI-LINE PRIMÅ, the next generation, incorporates the latest improvements in design, features, performance, and expanded capabilities:
- Automatic Standard Generation (ASG), validation and calibration
- Analyzer Health Monitor prompts for maintenance when necessary
- Bath Health Monitor For by-product, contamination, and yield monitoring/control
- Latest software, hardware and optimized delivery system
Watch this presentation to learn more about the QUALI-LINE® Chemical Monitoring Systems.
- Automatic Standard Generation (ASG), validation and calibration
- Analyzer Health Monitor for predictive maintenance
- Bath Health Monitor for yield improvement
- All-new modular design
- Latest software, hardware and optimized delivery system
- Rapid development for new chemistries
- Closed-loop communication with major tool manufacturers
- Small footprint
Organic Analysis: Accelerator, Suppressor, and Leveler Accuracy +/-4% or better Repeatability +/-3% or better
Inorganics Analysis: Copper, Chloride, and Acid Accuracy +/-3% or better Repeatability +/-2% or better
FM-4910 Compliant closure material
