QUALISURF® QSF-300 is specially designed to support Sigma Anisotropic Etch processes, used in Front End of Line (FEOL) Semiconductor manufacturing processes for Logic and DRAM, including 3D NAND, WLP Si Etch, SiGe, GAA, Via Reveal and more.
For better utilization of your existing equipment, connect QUALI-SURF to multiple tools and chemistries!
- Supports Multiple Chemistries and Process Tools
- Modular Design for Ultimate Flexibility
- Precise Control of the Most Demanding Specs
- Customized Metrology Proprietary Applications
- Maximizes Up-Time and Reliability
- Monitors Impact of Incoming Raw Material Variations
- Analyzer Health Monitor Keeps Track of System Performance
- Controls Advanced Cleaning Chemistries with Multiple Species
- Rapid Conversion from R&D to HVM
- Maintains Process Control Using Advanced SPC Capabilities
- The Lowest CoO with the Highest Operational Convenience
- Enables Chemical Vendors to Provide Metrology for Their Chemistries
- Option – Benchtop analyzer for labs
Watch this presentation to learn more about the QUALISURF® Chemical Monitoring Systems.
- Multi-channel capability to support all tanks for a process tool
- Supports integration/communication with all the process tools and the Fab host for closed loop control
- Minimal PM requirements
- Can be modified for sub-fab environment
- Simple operation with convenient user interface
- Safety standards – compliant with S2/S8 and CE
Contact us for specifications info
